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Intervalence plasmons in boron-doped diamond
Department of Nuclear, Plasma, and Radiological Engineering, The Grainger College of Engineering, University of Illinois Urbana-Champaign, Champaign, IL, USA.ORCID iD: 0000-0002-8132-9937
Department of Physics, Case Western Reserve University, Cleveland, OH, USA.
Department of Physics and Materials Science, University of Luxembourg, Esch-sur-Alzette, Luxembourg.
Aix Marseille Univ, CNRS, Centrale Med, Institut Fresnel, Marseille, France.
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2025 (English)In: Nature Communications, E-ISSN 2041-1723, Vol. 16, no 1, article id 444Article in journal (Refereed) Published
Abstract [en]

Doped semiconductors can exhibit metallic-like properties ranging from superconductivity to tunable localized surface plasmon resonances. Diamond is a wide-bandgap semiconductor that is rendered electronically active by incorporating a hole dopant, boron. While the effects of boron doping on the electronic band structure of diamond are well-studied, any link between charge carriers and plasmons has never been shown. Here, we report intervalence plasmons in boron-doped diamond, defined as collective electronic excitations between the valence subbands, opened up by the presence of holes. Evidence for these low-energy excitations is provided by valence electron energy loss spectroscopy and near-field infrared spectroscopy. The measured spectra are subsequently reproduced by first-principles calculations based on the contribution of intervalence band transitions to the dielectric function. Our calculations also reveal that the real part of the dielectric function exhibits a crossover characteristic of metallicity. These results suggest a new mechanism for inducing plasmon-like behavior in doped semiconductors, and the possibility of attaining such properties in diamond, a key emerging material for quantum information technologies.

Place, publisher, year, edition, pages
Springer Nature, 2025. Vol. 16, no 1, article id 444
National Category
Condensed Matter Physics
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URN: urn:nbn:se:umu:diva-234590DOI: 10.1038/s41467-024-55353-0ISI: 001397956900006PubMedID: 39809753Scopus ID: 2-s2.0-85215760132OAI: oai:DiVA.org:umu-234590DiVA, id: diva2:1931224
Funder
Swedish Research Council, 2021-05784The Kempe Foundations, JCK-3122Knut and Alice Wallenberg Foundation, 2023.0089Wenner-Gren Foundations, UPD2022-0074Available from: 2025-01-26 Created: 2025-01-26 Last updated: 2025-02-03Bibliographically approved

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Maccaferri, Nicolò

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Bhattacharya, SouvikMaccaferri, NicolòShenderova, OlgaLereu, Aude L.Wirtz, LudgerStrangi, GiuseppeSankaran, R. Mohan
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