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The photochemical coupling of fullerene molecules into covalently connected oligomeric or polymeric structures can result in drastically lowered solubility in common solvents with retained semiconductor properties. Here, we exploit this combination of properties for the utilization of fullerenes as a negative photoresist material with electronic functionality. Specifically, we develop an easily tunable exposure system, essentially comprising a laser and a computer-controlled spatial light modulator (SLM) featuring >8 million independently controlled pixels, for the spatially selective photochemical transformation of nanometer-thin C60 fullerene films. With a carefully designed laser-SLM-exposure/solvent-development cycle, we are able to realize well-resolved two-dimensional hexagonal or square patterns of circular C60 microdots with a center-to-center distance of 1–5 μm and a maximum thickness of 20–35 nm over several square-millimeter-sized areas on a substrate. The functionality of such a hexagonal C60 pattern was demonstrated by its inclusion in between the transparent electrode and the active material in a light-emitting electrochemical cell, which featured an enhanced light output by >50% in comparison to a reference device void of the patterned C60 layer.