Open this publication in new window or tab >>Show others...
2018 (English)In: Nano letters (Print), ISSN 1530-6984, E-ISSN 1530-6992, Vol. 18, no 1, p. 540-545Article in journal (Refereed) Published
Keywords
semiconducting nanostructure, mask- and resist-free patterning, laser interference lithography, fullerenes, phenyl-C 61-butyric acid methyl ester (PCBM), high contrast
National Category
Other Physics Topics
Identifiers
urn:nbn:se:umu:diva-143439 (URN)10.1021/acs.nanolett.7b04568 (DOI)000420000000073 ()29232948 (PubMedID)2-s2.0-85040374972 (Scopus ID)
2017-12-282017-12-282024-07-02Bibliographically approved